PS-200 single target magnetron sputtering coater is mainlycomposed of vacuum chamber, magnetron target, rotating substrate frame, vacuum system, frame, electrical control, etc.It can be used to prepare conductive film, metal film, dielectricfilm, semiconductor film, insulating film, multilayer film and soon. The equipment structure is compact, the floor area is smallsuits the university laboratory and the Scientific ResearchInstitute.
Environmental requirements
- Power supply: AC220V, power ≥20KVA
- Independent ground wire: <3w, flat copper wire 210mm2 is recommended for connection from equipment toground wire
- Water supply: flow rate ≥10 l/min water temperature 0-25 °C
- Room temperature: < 30 °C
- Relative humidity: < 75%
- High purity argon
- Indoor non-corrosive flammable, explosive, toxic gases, no large dust
