Electron beam evaporation coating machine can steam gold-plated film, dielectric film, optical film. For example, evaporation of MgF2 and other medium films on semiconductor or fused quartz and glass-ceramics substrate, the evaporation thickness of MgF2 is 10-150nm, and the thickness of aluminum plating is 5-3000nm when 10-4 Pahigh vacuum is used. The film has good bonding force and the surface is silver-white. Evaporation rate is stable. With acertain small batch production capacity. The equipment runsstably and reliably, and can work continuously for 24 hours. All parts of the equipment are brand new products, mature technology, intuitive and simple operation, equipment is easyto maintain and repair.
Electron Beam Evaporation Coater
Technical Parameters
No. | Product Parameters | Technical Indicators |
1 | Equipment structure | Box type vertical front door |
2 | Maximum baking temperature | 350°C (temperature measured in vacuum chamber space) |
3 | Limiting vacuum | 8x10-5 Pa, complete vacuum system (no load) |
4 | Working vacuum | After the system is exposed to the atmosphere, the vacuum degree isrestored:2x10-3Pa ≤15 minutes: 8x10-4Pa ≤30 minutes |
5 | Vacuum system leakage rate | Better than 5x10-8Pa*L/S (national standard) |
6 | Electronic gun | 270 degree E-gun |
7 | Film thickness controller | inficon lC/6 single probe quartz crystal film thickness controller |
8 | Complete machine | Color touch screen operation + imported PLC programmable controllercontrol, can achieve automatic vacuum control,workpiece rotation.workpiece baking |
Critical for military, aerospace, meteorology, astronomical observation, railway safety, and search & rescue operations.
Application Fields
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